Stress evolution in magnetron sputtered Ti–Zr–N and Ti–Ta–N films studied by in situ wafer curvature: Role of energetic particles
G. Abadias, L.E. Koutsokeras, Ph. Guerin, P. PatsalasVolume:
518
Year:
2009
Language:
english
Pages:
6
DOI:
10.1016/j.tsf.2009.07.183
File:
PDF, 457 KB
english, 2009