Photosensitive terpolymer for all-wet-etching process:...

Thin Solid Films 2010 Vol. 518; Iss. 8

Photosensitive terpolymer for all-wet-etching process: Material characterization and device fabrication

Abderrafia Moujoud, Sungho Kang, Hyun Jae Kim, Mark Andrews
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Volume:
518
Year:
2010
Language:
english
Pages:
5
DOI:
10.1016/j.tsf.2009.08.024
File:
PDF, 723 KB
english, 2010
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