Hydrogen plasma etching of silicon dioxide in a hollow...

Thin Solid Films 2010 Vol. 518; Iss. 12

Hydrogen plasma etching of silicon dioxide in a hollow cathode system

O. Peña, S. Muhl, W. López, L. Rodríguez-Fernández, J.L. Ruvalcaba-Sil
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Volume:
518
Year:
2010
Language:
english
Pages:
4
DOI:
10.1016/j.tsf.2009.08.042
File:
PDF, 422 KB
english, 2010
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