An optimized process for fabrication of high-aspect-ratio...

Thin Solid Films 2010 Vol. 518; Iss. 10

An optimized process for fabrication of high-aspect-ratio photoresist-derived carbon microelectrode array on silicon substrate

Zirong Tang, Tielin Shi, Jie Gong, Lei Nie, Shiyuan Liu
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Volume:
518
Year:
2010
Language:
english
Pages:
6
DOI:
10.1016/j.tsf.2009.09.048
File:
PDF, 1.03 MB
english, 2010
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