Si1−xGex growth using Si3H8 by low temperature chemical vapor deposition
Shotaro Takeuchi, Ngoc Duy Nguyen, Jozefien Goosens, Matty Caymax, Roger LooVolume:
518
Year:
2010
Language:
english
Pages:
1
DOI:
10.1016/j.tsf.2009.10.047
File:
PDF, 1.15 MB
english, 2010