Antimony surfactant for epitaxial growth of SiGe buffer...

Thin Solid Films 2010 Vol. 518; Iss. 6-supp-S1

Antimony surfactant for epitaxial growth of SiGe buffer layers at high deposition temperatures

Peter Storck, Martin Vorderwestner, Alexey Kondratyev, Roman Talalaev, Art Amamchyan, Egbert Woelk
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Volume:
518
Year:
2010
Language:
english
Pages:
1
DOI:
10.1016/j.tsf.2009.10.048
File:
PDF, 1.32 MB
english, 2010
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