Stability of silicon germanium stressors

Thin Solid Films 2010 Vol. 518; Iss. 6-supp-S1

Stability of silicon germanium stressors

P. Tomasini, V. Machkaoutsan, S.G. Thomas, R. Loo, M. Caymax, P. Verheyen
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Volume:
518
Year:
2010
Language:
english
Pages:
1
DOI:
10.1016/j.tsf.2009.10.071
File:
PDF, 348 KB
english, 2010
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