Novel chemical precursors and novel CVD strategies enabling...

Thin Solid Films 2010 Vol. 518; Iss. 6-supp-S1

Novel chemical precursors and novel CVD strategies enabling low temperature epitaxy of Si and Si:C alloys

M. Bauer, S.G. Thomas
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Volume:
518
Year:
2010
Language:
english
Pages:
1
DOI:
10.1016/j.tsf.2009.10.088
File:
PDF, 592 KB
english, 2010
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