Atomic layer deposition of HfO2: Growth initiation study on...

Thin Solid Films 2010 Vol. 518; Iss. 15

Atomic layer deposition of HfO2: Growth initiation study on metallic underlayers

Christopher L. Platt, Ning Li, Kejing Li, Tonya M. Klein
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Volume:
518
Year:
2010
Language:
english
Pages:
6
DOI:
10.1016/j.tsf.2009.10.146
File:
PDF, 1.07 MB
english, 2010
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