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Sputter deposition from a Ti2AlC target: Process characterization and conditions for growth of Ti2AlC
J. Frodelius, P. Eklund, M. Beckers, P.O.Å. Persson, H. Högberg, L. HultmanVolume:
518
Year:
2010
Language:
english
Pages:
6
DOI:
10.1016/j.tsf.2009.11.059
File:
PDF, 495 KB
english, 2010