Thermal Residual Stress Relaxation in Sputtered ZnO Film on...

Materials Science Forum 2011 / 3 Vol. 681

Thermal Residual Stress Relaxation in Sputtered ZnO Film on (100) Si Substrate Studied In Situ by Synchrotron X-Ray Diffraction

Krauss, Christopher, Geandier, Guillaume, Conchon, Florine, Renault, Pierre Olivier, Le Bourhis, Eric, Benedetto, Alessandro, Grachev, Sergey.Y., Goudeau, Philippe, Barthel, Etienne
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Volume:
681
Language:
english
Journal:
Materials Science Forum
DOI:
10.4028/www.scientific.net/MSF.681.127
Date:
March, 2011
File:
PDF, 447 KB
english, 2011
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