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Reactive chemical vapor deposition of Ti3SiC2 with and without pressure pulses: Effect on the ternary carbide texture
S. Jacques, H. Fakih, J.-C. VialaVolume:
518
Year:
2010
Language:
english
Pages:
7
DOI:
10.1016/j.tsf.2010.02.059
File:
PDF, 710 KB
english, 2010