Study of the refractive index change in a-Si:H thin films...

Thin Solid Films 2010 Vol. 518; Iss. 18

Study of the refractive index change in a-Si:H thin films patterned by 532 nm laser radiation for photovoltaic applications

M. Colina, C. Molpeceres, M. Holgado, J. Gandia, O. Nos, J.L. Ocaña
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Volume:
518
Year:
2010
Language:
english
Pages:
9
DOI:
10.1016/j.tsf.2010.04.016
File:
PDF, 717 KB
english, 2010
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