X-ray diffraction analysis of thermally-induced stress...

Thin Solid Films 2010 Vol. 518; Iss. 18

X-ray diffraction analysis of thermally-induced stress relaxation in ZnO films deposited by magnetron sputtering on (100) Si substrates

F. Conchon, P.O. Renault, P. Goudeau, E. Le Bourhis, E. Sondergard, E. Barthel, S. Grachev, E. Gouardes, V. Rondeau, R. Gy, R. Lazzari, J. Jupille, N. Brun
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Volume:
518
Year:
2010
Language:
english
Pages:
5
DOI:
10.1016/j.tsf.2010.04.037
File:
PDF, 385 KB
english, 2010
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