Correlation between structural and opto-electronic properties of a-Si1 − xCx:H films deposited by plasma enhanced chemical vapour deposition
G. Ambrosone, D.K. Basa, U. Coscia, P. RavaVolume:
518
Year:
2010
Language:
english
Pages:
4
DOI:
10.1016/j.tsf.2010.05.089
File:
PDF, 420 KB
english, 2010