High band gap nanocrystallite embedded amorphous silicon...

Thin Solid Films 2010 Vol. 518; Iss. 23

High band gap nanocrystallite embedded amorphous silicon prepared by hotwire chemical vapour deposition

Purabi Gogoi, Himanshu S. Jha, Pratima Agarwal
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Volume:
518
Year:
2010
Language:
english
Pages:
11
DOI:
10.1016/j.tsf.2010.06.040
File:
PDF, 2.20 MB
english, 2010
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