X-ray diffraction study of thermal stress relaxation in ZnO films deposited by magnetron sputtering
F. Conchon, P.O. Renault, E. Le Bourhis, C. Krauss, P. Goudeau, E. Barthel, S. Yu. Grachev, E. Sondergard, V. Rondeau, R. Gy, R. Lazzari, J. Jupille, N. BrunVolume:
519
Year:
2010
Language:
english
Pages:
5
DOI:
10.1016/j.tsf.2010.07.013
File:
PDF, 466 KB
english, 2010