Aluminum-induced crystallization of amorphous silicon films deposited by hot wire chemical vapor deposition on glass substrates
Ozgenc Ebil, Roger Aparicio, Robert BirkmireVolume:
519
Year:
2010
Language:
english
Pages:
6
DOI:
10.1016/j.tsf.2010.07.097
File:
PDF, 1.08 MB
english, 2010