Residual stress characterization of Al/SiC nanoscale...

Thin Solid Films 2010 Vol. 519; Iss. 2

Residual stress characterization of Al/SiC nanoscale multilayers using X-ray synchrotron radiation

D.R.P. Singh, X. Deng, N. Chawla, J. Bai, C. Hubbard, G. Tang, Y.-L. Shen
How much do you like this book?
What’s the quality of the file?
Download the book for quality assessment
What’s the quality of the downloaded files?
Volume:
519
Year:
2010
Language:
english
Pages:
7
DOI:
10.1016/j.tsf.2010.08.148
File:
PDF, 1.37 MB
english, 2010
Conversion to is in progress
Conversion to is failed