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Optical and structural properties of silicon oxynitride deposited by plasma enhanced chemical vapor deposition
J. Dupuis, E. Fourmond, D. Ballutaud, N. Bererd, M. LemitiVolume:
519
Year:
2010
Language:
english
Pages:
9
DOI:
10.1016/j.tsf.2010.09.036
File:
PDF, 1.20 MB
english, 2010