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Dielectric functions of PECVD-grown silicon nanoscale inclusions within rapid thermal annealed silicon-rich silicon nitride films
A.-S. Keita, A. En Naciri, F. Delachat, M. Carrada, G. Ferblantier, A. Slaoui, M. StchakovskyVolume:
519
Year:
2011
Language:
english
Pages:
4
DOI:
10.1016/j.tsf.2010.11.071
File:
PDF, 769 KB
english, 2011