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Ni–Al–O diffusion barrier layer for high-κ metal-oxide-semiconductor capacitor
D.Q. Wu, R. Jia, J.C. Yao, H.S. Zhao, A.M. ChangVolume:
519
Year:
2011
Language:
english
Pages:
5
DOI:
10.1016/j.tsf.2010.12.152
File:
PDF, 741 KB
english, 2011