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Effect of N2/H2 plasma treatment on the moisture adsorption of MOCVD–TiN films
J.K. Huang, Cheng-Liang Huang, Shih-Chieh Chang, Yi-Lung Cheng, Ying-Lang WangVolume:
519
Year:
2011
Language:
english
Pages:
4
DOI:
10.1016/j.tsf.2011.01.059
File:
PDF, 744 KB
english, 2011