Defect passivation by O2 plasma treatment on high-k...

Defect passivation by O2 plasma treatment on high-k dielectric HfO2 films at room temperature

Kou-Chen Liu, Jung-Ruey Tsai, Wen-Kai Lin, Chi-Shiau Li, Jyun-Ning Chen
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Volume:
519
Year:
2011
Language:
english
Pages:
4
DOI:
10.1016/j.tsf.2011.01.154
File:
PDF, 815 KB
english, 2011
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