Defect passivation by O2 plasma treatment on high-k dielectric HfO2 films at room temperature
Kou-Chen Liu, Jung-Ruey Tsai, Wen-Kai Lin, Chi-Shiau Li, Jyun-Ning ChenVolume:
519
Year:
2011
Language:
english
Pages:
4
DOI:
10.1016/j.tsf.2011.01.154
File:
PDF, 815 KB
english, 2011