Low temperature silicon epitaxy from trichlorosilane via mesoplasma chemical vapor deposition
Junichi Fukuda, Makoto Kambara, Toyonobu YoshidaVolume:
519
Year:
2011
Language:
english
Pages:
4
DOI:
10.1016/j.tsf.2011.01.216
File:
PDF, 627 KB
english, 2011