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The influence of deposition rate on the stress and microstructure of AlN films deposited from a filtered cathodic vacuum arc
M.B. Taylor, J.G. Partridge, D.G. McCulloch, M.M.M. Bilek, D.R. McKenzieVolume:
519
Year:
2011
Language:
english
Pages:
5
DOI:
10.1016/j.tsf.2011.01.273
File:
PDF, 732 KB
english, 2011