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Excellent passivation effect of Cat-CVD SiNx/i-a-Si stack films on Si substrates
Koichi Koyama, Keisuke Ohdaira, Hideki MatsumuraVolume:
519
Year:
2011
Language:
english
Pages:
3
DOI:
10.1016/j.tsf.2011.01.294
File:
PDF, 538 KB
english, 2011