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Advantage of plasma-less deposition in Cat-CVD to the performance of electronic devices
Hideki Matsumura, Tomoaki Hasegawa, Shogo Nishizaki, Keisuke OhdairaVolume:
519
Year:
2011
Language:
english
Pages:
3
DOI:
10.1016/j.tsf.2011.01.302
File:
PDF, 573 KB
english, 2011