N2 post-deposition treatment on silicon thin films with a hot-wire chemical vapor method at a low wire temperature
Yuhei Omori, Akimori Tabata, Akihiro KondoVolume:
519
Year:
2011
Language:
english
Pages:
3
DOI:
10.1016/j.tsf.2011.01.314
File:
PDF, 477 KB
english, 2011