N2 post-deposition treatment on silicon thin films with a...

N2 post-deposition treatment on silicon thin films with a hot-wire chemical vapor method at a low wire temperature

Yuhei Omori, Akimori Tabata, Akihiro Kondo
How much do you like this book?
What’s the quality of the file?
Download the book for quality assessment
What’s the quality of the downloaded files?
Volume:
519
Year:
2011
Language:
english
Pages:
3
DOI:
10.1016/j.tsf.2011.01.314
File:
PDF, 477 KB
english, 2011
Conversion to is in progress
Conversion to is failed