p and n-type germanium layers grown using iso-butyl germane...

Thin Solid Films 2011 Vol. 519; Iss. 13

p and n-type germanium layers grown using iso-butyl germane in a III-V metal-organic vapor phase epitaxy reactor

Roberto Jakomin, Gregoire Beaudoin, Noelle Gogneau, Bruno Lamare, Ludovic Largeau, Olivia Mauguin, Isabelle Sagnes
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Volume:
519
Year:
2011
Language:
english
Pages:
6
DOI:
10.1016/j.tsf.2011.02.019
File:
PDF, 1.87 MB
english, 2011
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