Comparative Study of Porosity in Low-k SiOCH Thin Films...

Materials Science Forum 2004 Vol. 445-446

Comparative Study of Porosity in Low-k SiOCH Thin Films Obtained at Different Deposition Conditions

Brusa, Roberto S., Macchi, C.E., Mariazzi, Sebastiano, Spagolla, Monica, Karwasz, Grzegorz P., Zecca, Antonio
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Volume:
445-446
Year:
2004
Language:
english
Journal:
Materials Science Forum
DOI:
10.4028/www.scientific.net/MSF.445-446.268
File:
PDF, 331 KB
english, 2004
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