Analysis of gate oxide damage by ultraviolet light during...

Thin Solid Films 2011 Vol. 519; Iss. 20

Analysis of gate oxide damage by ultraviolet light during oxide deposition in high density plasma

Dong Kwon Kim, JeongYun Lee, Dong-Hwan Kim, Kyoungsub Shin, Myeong-Cheol Kim, SiYoung Choi, ChangJin Kang
How much do you like this book?
What’s the quality of the file?
Download the book for quality assessment
What’s the quality of the downloaded files?
Volume:
519
Year:
2011
Language:
english
Pages:
4
DOI:
10.1016/j.tsf.2011.04.134
File:
PDF, 1.31 MB
english, 2011
Conversion to is in progress
Conversion to is failed