Influence of Post-Oxidation Process on the MOS Interface and MOSFETs Properties
Suzuki, Seiji, Cho, W.J., Kosugi, Ryouji, Senzaki, Junji, Harada, Shinsuke, Fukuda, KenjiVolume:
353-356
Year:
2001
Journal:
Materials Science Forum
DOI:
10.4028/www.scientific.net/MSF.353-356.643
File:
PDF, 355 KB
2001