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4H-SiC Bulk Growth Using High-Temperature Gas Source Method
Tokuda, Yuichiro, Kojima, Jun, Hara, Kazukuni, Tsuchida, Hidekazu, Onda, ShoichiVolume:
778-780
Language:
english
Journal:
Materials Science Forum
DOI:
10.4028/www.scientific.net/MSF.778-780.51
Date:
February, 2014
File:
PDF, 506 KB
english, 2014