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Boron-Induced Strain Relaxation in Hydrogen-Implanted SiGe/Si Heterostructures
Lee, Sheng-Wei, Chueh, Chi-An, Chang, Hung-TaiVolume:
156
Year:
2009
Language:
english
Journal:
Journal of The Electrochemical Society
DOI:
10.1149/1.3236680
File:
PDF, 662 KB
english, 2009