Metallorganic Chemical Vapor Deposition of TaO[sub x]N[sub y] as a High-Dielectric-Constant Material for Next-Generation Devices
Cho, Sung-Lae, Kim, Byung-Sung, Kim, Hyun-Mi, Chun, In Kyu, Kim, Ki-BumVolume:
149
Year:
2002
Language:
english
Journal:
Journal of The Electrochemical Society
DOI:
10.1149/1.1507786
File:
PDF, 593 KB
english, 2002