Epitaxial Deposition of Silicon Carbide Films in a Horizontal Hot-Wall CVD Reactor
Veneroni, Alessandro, Omarini, Fabrizio, Masi, Maurizio, Leone, Stefano, Mauceri, Marco, Pistone, Giuseppe, Abbondanza, GiuseppeVolume:
483-485
Year:
2005
Language:
english
Journal:
Materials Science Forum
DOI:
10.4028/www.scientific.net/MSF.483-485.57
File:
PDF, 309 KB
english, 2005