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Crystal Texture and Electromigration Damage in Al-Based Interconnect Lines Studied by ACOM with the SEM
Lepper, M., von Glasow, A., Piscevic, D., Schwarzer, Robert A.Volume:
273-275
Year:
1998
Journal:
Materials Science Forum
DOI:
10.4028/www.scientific.net/MSF.273-275.573
File:
PDF, 391 KB
1998