HfO[sub 2] Atomic Layer Deposition Using HfCl[sub 4]∕H[sub 2]O: The First Reaction Cycle
Nyns, L., Delabie, A., Caymax, M., Heyns, M. M., Van Elshocht, S., Vinckier, C., De Gendt, S.Volume:
155
Year:
2008
Language:
english
Journal:
Journal of The Electrochemical Society
DOI:
10.1149/1.2980427
File:
PDF, 247 KB
english, 2008