Process-Induced Changes of the Properties of Silicon Oxide...

Process-Induced Changes of the Properties of Silicon Oxide Layers Containing Carbon: A Study of a Low-k Material to be Used in the Interconnection System

Akhmetov, V.D., Kittler, Martin, Seifert, Winfried, Marschmeyer, S., Richter, Hans, Formanek, P., Doerschel, J.
How much do you like this book?
What’s the quality of the file?
Download the book for quality assessment
What’s the quality of the downloaded files?
Volume:
95-96
Year:
2004
Language:
english
Journal:
Solid State Phenomena
DOI:
10.4028/www.scientific.net/SSP.95-96.647
File:
PDF, 175 KB
english, 2004
Conversion to is in progress
Conversion to is failed