Atomic force microscopy study of photoresist sidewall smoothing and line edge roughness transfer during gate patterning
Fouchier, Marc, Pargon, ErwineVolume:
12
Language:
english
Journal:
Journal of Micro/Nanolithography, MEMS, and MOEMS
DOI:
10.1117/1.JMM.12.4.041308
Date:
October, 2013
File:
PDF, 3.89 MB
english, 2013