SPIE Proceedings [SPIE 15th Annual BACUS Symposium on Photomask Technology and Management '95 - Santa Clara, CA (Wednesday 20 September 1995)] 15th Annual BACUS Symposium on Photomask Technology and Management - Production performance of the EBES4 electron-beam lithography system
Walker, David M., Kugelmass, Sheldon M., Murray, K. A., Rose, C. M., Shelden, Gilbert V., Wiley, James N.Volume:
2621
Year:
1995
Language:
english
DOI:
10.1117/12.228200
File:
PDF, 417 KB
english, 1995