Amorphous hydrogenated carbon films used as masks for silicon microtips fabrication in a reactive ion etching with SF6 plasma
Marco A.R. Alves, Lésnir F. Porto, Pedro H.L. de Faria, Edmundo S. BragaVolume:
72
Year:
2004
Language:
english
Pages:
4
DOI:
10.1016/j.vacuum.2003.10.012
File:
PDF, 305 KB
english, 2004