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SPIE Proceedings [SPIE Advances in Resist Technology and Processing VIII - San Jose, United States (Monday 4 March 1991)] Advances in Resist Technology and Processing VIII - Negative chemical amplification resist systems based on polyhydroxystyrenes and N-substituted imides or aldehydes
Ito, Hiroshi, Schildknegt, Klaas, Mash, Eugene A., Ito, HiroshiVolume:
1466
Year:
1991
Language:
english
DOI:
10.1117/12.46389
File:
PDF, 988 KB
english, 1991