InN films deposited by rf reactive sputtering in pure...

Vacuum 2004 Vol. 74; Iss. 3-4

InN films deposited by rf reactive sputtering in pure nitrogen gas

S Inoue, T Namazu, T Suda, K Koterazawa
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Volume:
74
Year:
2004
Language:
english
Pages:
6
DOI:
10.1016/j.vacuum.2004.01.010
File:
PDF, 279 KB
english, 2004
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