Etching mechanism of (Pb,Sr)TiO3 thin films for DRAM application using Cl2/Ar inductively coupled plasma
Gwan-Ha Kim, Kyoung-Tae Kim, Dong-Pyo Kim, Chang-Il KimVolume:
74
Year:
2004
Language:
english
Pages:
5
DOI:
10.1016/j.vacuum.2004.01.018
File:
PDF, 213 KB
english, 2004