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Near-surface sensitive infrared reflection spectroscopy on SiO2 implanted with high-flux negative ions
H. Amekura, N. Umeda, N. KishimotoVolume:
74
Year:
2004
Language:
english
Pages:
5
DOI:
10.1016/j.vacuum.2004.01.026
File:
PDF, 294 KB
english, 2004