SPIE Proceedings [SPIE SPIE's 1994 Symposium on Microlithography - San Jose, CA (Sunday 27 February 1994)] Advances in Resist Technology and Processing XI - Acid size effect of chemically amplified negative resist on lithographic performance
Iwasaki, Haruo, Itani, Toshiro, Fujimoto, Masashi, Kasama, Kunihiko, Nalamasu, OmkaramVolume:
2195
Year:
1994
Language:
english
DOI:
10.1117/12.175333
File:
PDF, 352 KB
english, 1994