Catalytic properties of Al2O3 deposited by ion sputtering...

Vacuum 2005 Vol. 78; Iss. 2-4

Catalytic properties of Al2O3 deposited by ion sputtering using DC and RF sources

K. Reszka, J. Rakoczy, Zb. Żurek, A. Czyżniewski, A. Gilewicz, M. Homa
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Volume:
78
Year:
2005
Language:
english
Pages:
7
DOI:
10.1016/j.vacuum.2005.01.018
File:
PDF, 289 KB
english, 2005
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