Application of ion implantation for mono-Si piezoresistors...

Vacuum 2005 Vol. 78; Iss. 2-4

Application of ion implantation for mono-Si piezoresistors manufacturing in silicon MEMS technology

B. Jaroszewicz, K. Domanski, D. Tomaszewski, P. Janus, A. Kudla, B. Latecki, A. Kociubinski, M. Nikodem, J. Katcki, M. Wzorek, J. Marczewski, P. Grabiec
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Volume:
78
Year:
2005
Language:
english
Pages:
5
DOI:
10.1016/j.vacuum.2005.01.036
File:
PDF, 265 KB
english, 2005
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